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Research
The main object
amorphous silicon alloys (thin films)
nanocrystalline Si deposition, characterization, modification
transparent conductive oxides
solar cells
The main motiv
Establishing the correlation between thin films properties and growing conditions
Deposition- by using magnetron sputtering, PECVD (Plasma Enhanced Chemical Vapour Deposition)
Thin film characterisation:
optical properties
structural properties (IR spectroscopy, Raman, Micoscopy)
composition and chemical ordering (vibrational spectroscopy, nuclear methods)
Thin film modification:
thermal annealing
laser annealing
crystallization
Amorphous and nano-crystalline silicon alloys
Amorphous and nano-crystalline hydrogenated silicon (a-Si:H)
Amorphousand nano-crystalline hydrogenated silicon carbide (a-Si1-xCx:H)
Application
opto-electronic devices
photovoltaic solar cells
